TY - JOUR
T1 - Characterization of (001) β-Ga2O3 Schottky diodes with drift layer grown by MOCVD
AU - P. Sundaram, Prakash
AU - Liu, Fengdeng
AU - Alema, Fikadu
AU - Osinsky, Andrei
AU - Jalan, Bharat
AU - Koester, Steven J.
N1 - Publisher Copyright:
© 2023 Author(s).
PY - 2023/6/5
Y1 - 2023/6/5
N2 - Growing a thick high-quality epitaxial layer on the β-Ga2O3 substrate is crucial in commercializing β-Ga2O3 devices. Metal organic chemical vapor deposition (MOCVD) is also well-established for the large-scale commercial growth of β-Ga2O3 and related heterostructures. This paper presents a systematic study of the Schottky barrier diodes fabricated on two different Si-doped homoepitaxial β-Ga2O3 thin films grown on Sn-doped (001) and (010) β-Ga2O3 substrates by MOCVD. X-ray diffraction analysis of the MOCVD-grown sample, room temperature current density-voltage data for different Schottky diodes, and C-V measurements are presented. Diode characteristics, such as ideality factor, barrier height, specific on-resistance, and breakdown voltage, are studied. Temperature dependence (170-360 K) of the ideality factor, barrier height, and Poole-Frenkel reverse leakage mechanism are also analyzed from the J-V-T characteristics of the fabricated Schottky diodes.
AB - Growing a thick high-quality epitaxial layer on the β-Ga2O3 substrate is crucial in commercializing β-Ga2O3 devices. Metal organic chemical vapor deposition (MOCVD) is also well-established for the large-scale commercial growth of β-Ga2O3 and related heterostructures. This paper presents a systematic study of the Schottky barrier diodes fabricated on two different Si-doped homoepitaxial β-Ga2O3 thin films grown on Sn-doped (001) and (010) β-Ga2O3 substrates by MOCVD. X-ray diffraction analysis of the MOCVD-grown sample, room temperature current density-voltage data for different Schottky diodes, and C-V measurements are presented. Diode characteristics, such as ideality factor, barrier height, specific on-resistance, and breakdown voltage, are studied. Temperature dependence (170-360 K) of the ideality factor, barrier height, and Poole-Frenkel reverse leakage mechanism are also analyzed from the J-V-T characteristics of the fabricated Schottky diodes.
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U2 - 10.1063/5.0155622
DO - 10.1063/5.0155622
M3 - Article
AN - SCOPUS:85161923753
SN - 0003-6951
VL - 122
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 23
M1 - 232105
ER -