Abstract
Films of metallic aluminum are utilized widely in several industries. We will begin this chapter with a brief summary of these and focus on some of the critical physical properties required by these diverse applications. An association between these physical properties and the microstructure of the film will be made whenever possible. Following a general comparison between physical and chemical vapor deposition processes, we highlight some general features of CVD and their relationship to film stucture. The majority of the chapter will summarize the literature describing the CVD of A1.
| Original language | English (US) |
|---|---|
| Title of host publication | The Chemistry of Metal CVD |
| Publisher | Wiley-VCH Verlag |
| Pages | 45-103 |
| Number of pages | 59 |
| ISBN (Electronic) | 9783527615858 |
| ISBN (Print) | 3527290710, 9783527290710 |
| DOIs | |
| State | Published - Dec 26 2007 |
Bibliographical note
Publisher Copyright:© VCH Verlagsgesellschaft mbH, D-6945 1 Weinheim (Federal Republic of Germany), 1994. All rights reserved.
Keywords
- Alane precursors
- Applications of aluminum films
- Physical vapor deposition
- Surface diffusion
- Triisobutylaluminum