Direct magnetic patterning of non-magnetic Co/C thin films by electron-beam radiation

T. J. Zhou, Y. Zhao, J. P. Wang, T. C. Chong, J. T L Thong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Conventional electron beam lithography (EBL) has been used for fabricating patterned nanostructure, however, it involves the cumbersome process of resist coating, etching, lift-off, etc., which greatly complicates the production of patterned nanostructures. Mask-assistant ion beam mixing of multilayer films has been proposed but demonstrated low-resolution. A novel method involving direct magnetic patterning of a non-magnetic film by e-beam radiation induced nano-scale phase change is proposed in this paper, and preliminary results are presented. Metastable amorphous Co-C thin films were selected for this study.

Original languageEnglish (US)
Title of host publicationINTERMAG Europe 2002 - IEEE International Magnetics Conference
EditorsJ. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780373650, 9780780373655
DOIs
StatePublished - 2002
Event2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands
Duration: Apr 28 2002May 2 2002

Publication series

NameINTERMAG Europe 2002 - IEEE International Magnetics Conference

Other

Other2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
Country/TerritoryNetherlands
CityAmsterdam
Period4/28/025/2/02

Bibliographical note

Publisher Copyright:
©2002 IEEE.

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