FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO2 Wafers

Deyuan Lyu; Jenae E. Shoup; Dingbin Huang; Xiaojia Wang; Daniel B. Gopman; Jian Ping Wang

doi:10.1109/INTERMAGShortPapers58606.2023.10228223

FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO₂ Wafers

Deyuan Lyu, Jenae E. Shoup, Dingbin Huang, Xiaojia Wang, Daniel B. Gopman, Jian Ping Wang

Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

(001)-textured L1₀-phase FePd possesses strong crystalline perpendicular magnetic anisotropy (PMA) and low Gilbert damping constant and thus, is considered a promising material choice for scalable spintronic devices. To date, however, well-textured L1₀-FePd(001) thin films can only be prepared on a few expensive substrates, which directly impedes their industry compatibility and application prospect. In this digest, we report the deposition of L1₀-FePd(001) single layer and synthetic antiferromagnet (SAF) on industry-ready Si/SiO₂ wafers with large PMA, low damping, and strong antiferromagnetic interlayer exchange coupling. The microstructures of L1₀-FePd(001) single layer and SAF were imaged using scanning transmission electron microscopy. We observed sharp and flat interfaces between each layer as well as the heteroepitaxial growth of sample stacks, which explains the high performance of the samples.

Original language	English (US)
Title of host publication	2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9798350338362
DOIs	https://doi.org/10.1109/INTERMAGShortPapers58606.2023.10228223
State	Published - 2023
Event	2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Sendai, Japan Duration: May 15 2023 → May 19 2023

Publication series

Name	2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings

Conference

Conference	2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023
Country/Territory	Japan
City	Sendai
Period	5/15/23 → 5/19/23

Bibliographical note

Publisher Copyright:
© 2023 IEEE.

Keywords

L1-FePd
Spintronics
industry compatibility
perpendicular magnetic anisotropy
synthetic antiferromagnets

Access

10.1109/INTERMAGShortPapers58606.2023.10228223

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Cite this

Lyu, D., Shoup, J. E., Huang, D., Wang, X., Gopman, D. B., & Wang, J. P. (2023). FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO₂ Wafers. In 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings (2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTERMAGShortPapers58606.2023.10228223

FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO₂ Wafers. / Lyu, Deyuan; Shoup, Jenae E.; Huang, Dingbin et al.
2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings. Institute of Electrical and Electronics Engineers Inc., 2023. (2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lyu, D, Shoup, JE, Huang, D, Wang, X, Gopman, DB & Wang, JP 2023, FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO₂ Wafers. in 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings. 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings, Institute of Electrical and Electronics Engineers Inc., 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023, Sendai, Japan, 5/15/23. https://doi.org/10.1109/INTERMAGShortPapers58606.2023.10228223

Lyu D, Shoup JE, Huang D, Wang X, Gopman DB, Wang JP. FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO₂ Wafers. In 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings. Institute of Electrical and Electronics Engineers Inc. 2023. (2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings). doi: 10.1109/INTERMAGShortPapers58606.2023.10228223

Lyu, Deyuan ; Shoup, Jenae E. ; Huang, Dingbin et al. / FePd Single Layer and Synthetic Antiferromagnet with Low Damping and Crystalline Perpendicular Magnetic Anisotropy on Amorphous Si/SiO₂ Wafers. 2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings. Institute of Electrical and Electronics Engineers Inc., 2023. (2023 IEEE International Magnetic Conference - Short Papers, INTERMAG Short Papers 2023 - Proceedings).

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abstract = "(001)-textured L10-phase FePd possesses strong crystalline perpendicular magnetic anisotropy (PMA) and low Gilbert damping constant and thus, is considered a promising material choice for scalable spintronic devices. To date, however, well-textured L10-FePd(001) thin films can only be prepared on a few expensive substrates, which directly impedes their industry compatibility and application prospect. In this digest, we report the deposition of L10-FePd(001) single layer and synthetic antiferromagnet (SAF) on industry-ready Si/SiO2 wafers with large PMA, low damping, and strong antiferromagnetic interlayer exchange coupling. The microstructures of L10-FePd(001) single layer and SAF were imaged using scanning transmission electron microscopy. We observed sharp and flat interfaces between each layer as well as the heteroepitaxial growth of sample stacks, which explains the high performance of the samples.",

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