Influence of Codeposition on Methylammonium Iodide Degradation during Vapor Transport Deposition

Ella L. Wassweiler, Tamar Kadosh, Deepta Gupta, Thienan Nguyen, Wan Ju Hsu, Emma Pettit, Russell J. Holmes, Harry Tuller, Vladimir Bulovic

Research output: Contribution to journalArticlepeer-review

Abstract

Vapor transport deposition (VTD) is one manufacturing-compatible technique for the large-scale deposition of perovskite films. However, to date, little understanding has been given to degradation products formed by perovskites grown under vacuum. Here, we use methylammonium iodide (MAI) as an example organic precursor to identify degradation patterns through both the sublimation process and transport through a zone with temperatures much higher than that where MAI can thermodynamically survive. We show that degradation due to sublimation effects MAI powders and subsequent integration into methylammonium lead iodide (MAPbI3) films differently than degradation solely due to material transport through a very high-temperature zone. Additionally, we categorize common postdeposition treatments by their influence on the degradation products seen in MAPbI3 films. With these results, we give recommendations for VTD reactor design and the feasibility of codeposition as a film growth technique.

Original languageEnglish (US)
Pages (from-to)24626-24632
Number of pages7
JournalJournal of Physical Chemistry C
Volume127
Issue number51
DOIs
StatePublished - Dec 28 2023
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2023 American Chemical Society.

Fingerprint

Dive into the research topics of 'Influence of Codeposition on Methylammonium Iodide Degradation during Vapor Transport Deposition'. Together they form a unique fingerprint.

Cite this