Abstract
The oxidation-reduction kinetics of Pd was investigated on polycrystalline Pd foils using XPS and sputter-depth profiling over a wide range of temperatures. The observed behavior can be explained in terms of a desorption-controlled process at lower temperatures (T < 230°C) and a diffusion-controlled process at higher temperatures (T > 450°C). In the intermediate range (230 < T < 450°C) a transition between the two processes is observed which gives rise to a pronounced shoulder in the reduction time trace. The interpretation is qualitatively confirmed using a simple mathematical model for a coupled bulk diffusion/surface reaction system.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 199-206 |
| Number of pages | 8 |
| Journal | Catalysis Letters |
| Volume | 58 |
| Issue number | 4 |
| DOIs | |
| State | Published - Apr 1999 |
Bibliographical note
Funding Information:GV gratefully acknowledges financial support through a fellowship of the Deutsche Forschungsgemeinschaft, as well as the hospitality of the Surface Analysis Center at the University of Minnesota.
Keywords
- Oxidation-reduction
- Palladium
- Reaction-diffusion model
- Sputter-depth profiling
- XPS