Particle beam mass spectrometer measurements of particle formation during low pressure chemical vapor deposition of polysilicon and SiO₂ films

Engineering & Materials Science

• Particle beams 100%
• Low pressure chemical vapor deposition 98%
• Mass spectrometers 86%
• Polysilicon 70%
• Furnaces 21%
• Oxides 20%
• Temperature 19%
• Oxide films 15%
• Semiconductor devices 14%
• Particle size analysis 13%
• Nucleation 12%
• Particle size 11%
• Fabrication 8%
• Experiments 4%

Physics & Astronomy

• particle beams 68%
• mass spectrometers 62%
• low pressure 50%
• vapor deposition 46%
• reactors 30%
• critical pressure 24%
• furnaces 18%
• oxides 12%
• particle size distribution 10%
• semiconductor devices 10%
• low concentrations 9%
• proportion 9%
• oxide films 9%
• silicon dioxide 7%
• wafers 7%
• nucleation 7%
• tubes 7%
• fabrication 6%
• temperature 5%
• performance 4%

Chemical Compounds

• Particle Beam 94%
• Low Pressure Chemical Vapour Deposition 88%
• Critical Pressure 35%
• Liquid Film 29%
• Oxide 19%
• Silicon Dioxide 14%
• Vapor Deposition Process 14%
• Pressure 14%
• Residence Time 12%
• Particle Size Distribution 11%
• Nucleation 9%
• Semiconductor 9%