TY - JOUR
T1 - Phase-sensitive bichromatic photoresistance in a two-dimensional electron gas
AU - Shi, Q.
AU - Khodas, M.
AU - Levchenko, A.
AU - Zudov, M. A.
PY - 2013/12/10
Y1 - 2013/12/10
N2 - We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies ω1 and ω2) using quantum kinetic equation. We have found that when ω2/ω1=1+2/N, where N is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.
AB - We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies ω1 and ω2) using quantum kinetic equation. We have found that when ω2/ω1=1+2/N, where N is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.
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U2 - 10.1103/PhysRevB.88.245409
DO - 10.1103/PhysRevB.88.245409
M3 - Article
AN - SCOPUS:84890659154
SN - 1098-0121
VL - 88
JO - Physical Review B - Condensed Matter and Materials Physics
JF - Physical Review B - Condensed Matter and Materials Physics
IS - 24
M1 - 245409
ER -