Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth

L. M. Belova; E. D. Dahlberg; A. Riazanova; J. J.L. Mulders; C. Christophersen; J. Eckert

doi:10.1088/0957-4484/22/14/145305

Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth

L. M. Belova, E. D. Dahlberg, A. Riazanova, J. J.L. Mulders, C. Christophersen, J. Eckert

Physics and Astronomy (Twin Cities)

Research output: Contribution to journal › Article › peer-review

41 Scopus citations

Abstract

A new method of direct, rapid nano-to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co ₂(CO)₈ is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 °C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, 22 νΩcm, and saturation magnetization, 1.55T, are much closer to the corresponding values for bulk Co than those for standard EBID.

Original language	English (US)
Article number	145305
Journal	Nanotechnology
Volume	22
Issue number	14
DOIs	https://doi.org/10.1088/0957-4484/22/14/145305
State	Published - Apr 8 2011

Access

10.1088/0957-4484/22/14/145305

OpenUrl availability

Full text

Cite this

@article{4df6997ff39440c2af238e7eccb64b32,

title = "Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth",

abstract = "A new method of direct, rapid nano-to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co 2(CO)8 is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 °C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, 22 νΩcm, and saturation magnetization, 1.55T, are much closer to the corresponding values for bulk Co than those for standard EBID.",

author = "Belova, {L. M.} and Dahlberg, {E. D.} and A. Riazanova and Mulders, {J. J.L.} and C. Christophersen and J. Eckert",

year = "2011",

month = apr,

day = "8",

doi = "10.1088/0957-4484/22/14/145305",

language = "English (US)",

volume = "22",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing Ltd.",

number = "14",

}

TY - JOUR

T1 - Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth

AU - Belova, L. M.

AU - Dahlberg, E. D.

AU - Riazanova, A.

AU - Mulders, J. J.L.

AU - Christophersen, C.

AU - Eckert, J.

PY - 2011/4/8

Y1 - 2011/4/8

N2 - A new method of direct, rapid nano-to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co 2(CO)8 is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 °C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, 22 νΩcm, and saturation magnetization, 1.55T, are much closer to the corresponding values for bulk Co than those for standard EBID.

AB - A new method of direct, rapid nano-to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co 2(CO)8 is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 °C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, 22 νΩcm, and saturation magnetization, 1.55T, are much closer to the corresponding values for bulk Co than those for standard EBID.

UR - http://www.scopus.com/inward/record.url?scp=79952670642&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79952670642&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/22/14/145305

DO - 10.1088/0957-4484/22/14/145305

M3 - Article

C2 - 21368354

AN - SCOPUS:79952670642

SN - 0957-4484

VL - 22

JO - Nanotechnology

JF - Nanotechnology

IS - 14

M1 - 145305

ER -

Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth

Abstract

Access

OpenUrl availability

Other files and links

Fingerprint

Cite this