Technique for measurement of magnetostriction in an individual nanowire using atomic force microscopy

We have investigated a method for measuring the dimensions of an individual multilayered Fe-Ga/Cu nanowire (NW) as it changes with induced magnetization. In this study, we demonstrate the proposed approach and establish this as a viable method for measuring the magnetostrictive behavior of an individual Fe-Ga/Cu NW using atomic force microscopy (AFM). When an external magnetic field (∼300 Oe) was applied perpendicular to the NW axis, the NW length appeared minimized. When a field (∼1000 Oe) was applied parallel to the NW axis, the height profile of the NW was found to be higher than in the case with no parallel external field. Since both ends of the NW were welded to the substrate, the magnetic field induced dimensional change of the NW caused deflection of the NW in the upward direction, which was significant enough to be detected by AFM. An average height difference of 15 nm was measured with and without an applied field which was then used to calculate the magnetostriction of the multilayered NW.